The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2024
Filed:
Sep. 11, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Taro Ikeda, Nirasaki, JP;
Atsushi Kubo, Tokyo, JP;
Eiki Kamata, Nirasaki, JP;
Nobuhiko Yamamoto, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/511 (2006.01); C23C 16/52 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3222 (2013.01); C23C 16/52 (2013.01); H01J 37/32266 (2013.01); H01J 37/32311 (2013.01); H01L 21/67288 (2013.01); C23C 16/511 (2013.01); H01J 37/32201 (2013.01); H01J 37/32229 (2013.01); H01J 37/32293 (2013.01); H01J 37/3244 (2013.01); H01J 37/32715 (2013.01); H01J 2237/202 (2013.01);
Abstract
A plasma processing apparatus includes: a processing container; a substrate holder disposed within the processing container and configured to hold a substrate thereon; a dielectric window disposed below the substrate holder; and a plurality of phased array antennas disposed below the dielectric window and configured to irradiate a plurality of electromagnetic waves.