The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2024
Filed:
Mar. 31, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Zhiyuan Ye, San Jose, CA (US);
Shu-Kwan Danny Lau, Sunnyvale, CA (US);
Brian H. Burrows, San Jose, CA (US);
Lori Washington, Union City, CA (US);
Herman Diniz, Fremont, CA (US);
Martin A. Hilkene, Gilroy, CA (US);
Richard O. Collins, Santa Clara, CA (US);
Nyi O. Myo, San Jose, CA (US);
Manish Hemkar, Sunnyvale, CA (US);
Schubert S. Chu, San Francisco, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for a process chamber for thermal processing is described herein. The process chamber is a dual process chamber and shares a chamber body. The chamber body includes a first and a second set of gas inject passages. The chamber body may also include a first and a second set of exhaust ports. The process chamber may have a shared gas panel and/or a shared exhaust conduit.