The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2024

Filed:

Apr. 19, 2023
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Kuo-Nan Yang, Hsinchu, TW;

Wan-Yu Lo, Taoyuan, TW;

Chung-Hsing Wang, Hsinchu County, TW;

Hiranmay Biswas, Kolkata, IN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/398 (2020.01); G06F 30/392 (2020.01); G06F 30/394 (2020.01);
U.S. Cl.
CPC ...
G06F 30/398 (2020.01); G06F 30/392 (2020.01); G06F 30/394 (2020.01);
Abstract

A method of forming a semiconductor device including: providing a first circuit cell including a first pin cell; forming a connecting path originated from the first pin cell of the first circuit cell; performing an Electromigration (EM) checking process with a first parasitic capacitance of the first pin cell and a second parasitic capacitance of the connecting path by loading a loading capacitance file to determine whether the loading capacitance of the first pin cell is larger than a first predetermined capacitance; and substituting a second pin cell for the first pin cell when the loading capacitance of the first pin cell is larger than the first predetermined capacitance, wherein the second pin cell is different from the first pin cell.


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