The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2024
Filed:
Nov. 30, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Ryota Ifuku, Nirasaki, JP;
Takashi Matsumoto, Nirasaki, JP;
Masahito Sugiura, Nirasaki, JP;
Makoto Wada, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/511 (2006.01); C23C 16/26 (2006.01); C23C 16/44 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/511 (2013.01); C23C 16/26 (2013.01); C23C 16/4405 (2013.01); H01J 37/32192 (2013.01); H01J 37/32715 (2013.01); H01J 37/32816 (2013.01); H01J 37/32862 (2013.01); H01L 21/02115 (2013.01); H01L 21/02274 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3323 (2013.01);
Abstract
There is provided a film forming method of forming a carbon-containing film by a microwave plasma from a microwave source, the film forming method including: a dummy step of performing a dummy process by generating plasma of a first carbon-containing gas within a processing container; a placement step of placing a substrate on a stage within the processing container; and a film forming step of forming the carbon-containing film on the substrate using plasma of a second carbon-containing gas.