The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 11, 2024

Filed:

Dec. 08, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Chih Yung Hung, Hsinchu, TW;

Shahaji B. More, Hsinchu, TW;

Chien-Feng Lin, Hsinchu County, TW;

Cheng-Han Lee, New Taipei, TW;

Shih-Chieh Chang, Taipei, TW;

Ching-Lun Lai, Taichung, TW;

Wei-Jen Lo, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C30B 25/10 (2006.01); C30B 25/12 (2006.01); C30B 25/16 (2006.01); H01L 21/268 (2006.01); H01L 21/66 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02636 (2013.01); C30B 25/105 (2013.01); C30B 25/12 (2013.01); C30B 25/16 (2013.01); H01L 21/268 (2013.01); H01L 21/68764 (2013.01); H01L 22/20 (2013.01);
Abstract

The present disclosure provides a semiconductor processing apparatus according to one embodiment. The semiconductor processing apparatus includes a chamber; a base station located in the chamber for supporting a semiconductor substrate; a preheating assembly surrounding the base station; a first heating element fixed relative to the base station and configured to direct heat to the semiconductor substrate; and a second heating element moveable relative to the base station and operable to direct heat to a portion of the semiconductor substrate.


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