The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2024
Filed:
Aug. 27, 2021
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Chia-Cheng Chen, Hsinchu, TW;
Chih-Kai Yang, Taipei, TW;
Liang-Yin Chen, Hsinchu, TW;
Huicheng Chang, Tainan, TW;
Yee-Chia Yeo, Hsinchu, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01J 37/20 (2006.01); H01J 37/22 (2006.01); H01J 37/304 (2006.01); H01J 37/317 (2006.01); H01L 21/265 (2006.01); H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); H01J 37/20 (2013.01); H01J 37/22 (2013.01); H01J 37/3045 (2013.01); H01J 37/3171 (2013.01); H01L 21/265 (2013.01); H01L 23/544 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/30438 (2013.01); H01L 2223/54426 (2013.01);
Abstract
In an embodiment, a method includes: placing a wafer on an implanter platen, the wafer including alignment marks; measuring a position of the wafer by measuring positions of the alignment marks with one or more cameras; determining an angular displacement between the position of the wafer and a reference position of the wafer; and rotating the implanter platen by the angular displacement.