The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2024

Filed:

Jun. 23, 2021
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Takashi Mitsuya, Tokyo, JP;

Asagi Matsugu, Tokyo, JP;

Ayumu Saito, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 37/005 (2012.01); H01L 21/66 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
B24B 37/005 (2013.01); H01L 21/30625 (2013.01); H01L 22/26 (2013.01);
Abstract

Accuracy of detection of a fly out of a substrate from a polishing head is improved. A substrate processing apparatus includes a polishing tableto which a polishing padfor polishing the substrate is attachable, a polishing headfor holding and pressing the substrate against the polishing pad, a retainer member disposed surrounding the polishing head, a retainer member pressurization chamber disposed adjacent to the retainer member, an armfor holding and turning the polishing head, and a slip out detectorfor detecting a fly out of the substrate from the polishing headbased on a turning torque of the armor based on a flow rate of a fluid supplied to the retainer member pressurization chamber.


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