The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2024

Filed:

Jun. 25, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Jingyun Zhang, Albany, NY (US);

Ruilong Xie, Niskayuna, NY (US);

Reinaldo Vega, Mahopac, NY (US);

Kangguo Cheng, Schenectady, NY (US);

Lan Yu, Voorheesville, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/786 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/6653 (2013.01); H01L 29/0653 (2013.01); H01L 29/66545 (2013.01); H01L 29/66553 (2013.01); H01L 29/66742 (2013.01); H01L 29/78696 (2013.01); H01L 29/0665 (2013.01); H01L 29/42392 (2013.01);
Abstract

Embodiments disclosed herein include a nanosheet transistor for reducing parasitic capacitance. The nanosheet transistor may include a spacer region between a high-k metal gate and an epitaxial layer. The spacer region may include a first nanosheet stack with a first nanosheet and a second nanosheet. The spacer region may include an inner spacer region between the first nanosheet and the second nanosheet, and a side subway region located along an edge of the first nanosheet, the inner spacer region, and the second nanosheet.


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