The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2024

Filed:

Mar. 27, 2019
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Minami Shouji, Tokyo, JP;

Natsuki Tsuno, Tokyo, JP;

Hiroya Ohta, Tokyo, JP;

Daisuke Bizen, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/22 (2006.01); H01J 37/244 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/222 (2013.01); H01J 37/224 (2013.01); H01J 37/226 (2013.01); H01J 37/244 (2013.01); H01J 37/265 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/2817 (2013.01);
Abstract

An object of the invention is to provide a charged particle beam device capable of increasing the contrast of an observation image of a sample as much as possible in accordance with light absorption characteristics that change for each optical parameter. The charged particle beam device according to the invention changes an optical parameter such as a polarization plane of light emitted to the sample, and generates the observation image having a contrast corresponding to the changed optical parameter. An optical parameter that maximizes a light absorption coefficient of the sample is specified according to a feature amount of a shape pattern of the sample (refer to FIG.).


Find Patent Forward Citations

Loading…