The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2024
Filed:
Nov. 01, 2021
Rigaku Corporation, Akishima, JP;
Makoto Kambe, Takatsuki, JP;
Kazuhiko Omote, Akishima, JP;
Toshifumi Higuchi, Takatsuki, JP;
Tsutomu Tada, Takatsuki, JP;
Hajime Fujimura, Takatsuki, JP;
Masahiro Nonoguchi, Akishima, JP;
Licai Jiang, Auburn Hills, MI (US);
Boris Verman, Auburn Hills, MI (US);
Yuriy Platonov, Auburn Hills, MI (US);
RIGAKU CORPORATION, Tokyo, JP;
Abstract
Provided is a total reflection X-ray fluorescence spectrometer which has high analysis sensitivity and analysis speed. The total reflection X-ray fluorescence spectrometer includes: an X-ray source that has an electron beam focal point having an effective width in a direction parallel to a surface of a sample, and orthogonal to an X-ray irradiation direction, that is larger than a dimension in the irradiation direction; a reflective optic that has an effective width in the orthogonal direction that is larger than that of the electron beam focal point, and has a curved surface in the irradiation direction; and a plurality of detectors that are arranged in a row in the orthogonal direction, and are configured to measure intensities of fluorescent X-rays emitted from the sample irradiated with primary X-rays focused by the reflective optic.