The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2024
Filed:
Feb. 06, 2020
Asml Netherlands B.v., Veldhoven, NL;
Wim Tjibbo Tel, Helmond, NL;
Hermanus Adrianus Dillen, Maarheeze, NL;
Marc Jurian Kea, Morgan Hill, CA (US);
Mark John Maslow, Eindhoven, NL;
Koen Thuijs, Vaught, NL;
Peter David Engblom, Hillsboro, OR (US);
Ralph Timotheus Huijgen, Hillsboro, OR (US);
Daan Maurits Slotboom, Wolphaartsdijk, NL;
Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.