The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2024
Filed:
May. 21, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Xi Cen, San Jose, CA (US);
Kai Wu, Palo Alto, CA (US);
Seshadri Ganguli, Sunnyvale, CA (US);
Xinming Zhang, Santa Clara, CA (US);
Norman L. Tam, San Jose, CA (US);
Abhilash Mayur, Salinas, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods of depositing a metal film are discussed. A metal film is formed on the bottom of feature having a metal bottom and dielectric sidewalls. Formation of the metal film comprises exposure to a metal precursor and an alkyl halide catalyst while the substrate is maintained at a deposition temperature. The metal precursor has a decomposition temperature above the deposition temperature. The alkyl halide comprises carbon and halogen, and the halogen comprises bromine or iodine.