The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 2023

Filed:

Jul. 27, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chun-Hsiung Lin, Zhubei, TW;

Pei-Hsun Wang, Kaohsiung, TW;

Chih-Chao Chou, Hsinchu, TW;

Chia-Hao Chang, Hsinchu, TW;

Chih-Hao Wang, Baoshan Township, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/08 (2006.01); H01L 29/06 (2006.01); H01L 29/78 (2006.01); H01L 21/033 (2006.01); H01L 21/8234 (2006.01); H01L 27/088 (2006.01); H01L 21/768 (2006.01); H01L 21/764 (2006.01);
U.S. Cl.
CPC ...
H01L 29/6653 (2013.01); H01L 21/0337 (2013.01); H01L 21/764 (2013.01); H01L 21/76832 (2013.01); H01L 21/823431 (2013.01); H01L 21/823468 (2013.01); H01L 27/0886 (2013.01); H01L 29/0649 (2013.01); H01L 29/0847 (2013.01); H01L 29/6656 (2013.01); H01L 29/66545 (2013.01); H01L 29/66795 (2013.01); H01L 29/785 (2013.01);
Abstract

A semiconductor device is provided. The semiconductor device includes a fin protruding from a semiconductor substrate and a gate structure formed across the fin. The semiconductor device also includes a gate spacer formed over a sidewall of the gate structure. The gate spacer includes a sidewall spacer and a sealing spacer formed above the sidewall spacer. In addition, an air gap is vertically sandwiched between the sidewall spacer and the sealing spacer. The semiconductor device further includes a hard mask formed over the gate structure and covering a sidewall of the sealing spacer.


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