The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2023
Filed:
Jun. 28, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Hari Soundararajan, Sunnyvale, CA (US);
Shou-Sung Chang, Mountain View, CA (US);
Calvin Lee, Oakland, CA (US);
Jonathan P. Domin, Sunnyvale, CA (US);
Shuchivrat Datar, Cupertino, CA (US);
Dmitry Sklyar, San Jose, CA (US);
Paul D. Butterfield, San Jose, CA (US);
Chad Pollard, San Jose, CA (US);
Haosheng Wu, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A chemical mechanical polishing system includes a steam generator with a heating element to apply heat to a vessel to generate steam, an opening to deliver steam onto a polishing pad, a first valve in a fluid line between the opening and the vessel, a sensor to monitor a steam parameter, and a control system. The control system causes the valve to open and close in accordance with a steam delivery schedule in a recipe, receive a measured value for the steam parameter from the sensor, receive a target value for the steam parameter, and perform a proportional integral derivative control algorithm with the target value and measured value as inputs so as to control the first valve and/or a second pressure release valve and/or the heating element such that the measured value reaches the target value substantially just before the valve is opened according to the steam delivery schedule.