The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2023
Filed:
Jul. 30, 2021
Asml Netherlands B.v., Veldhoven, NL;
Abraham Slachter, Waalre, NL;
Stefan Hunsche, Santa Clara, CA (US);
Wim Tjibbo Tel, Helmond, NL;
Anton Bernhard Van Oosten, Lommel, BE;
Koenraad Van Ingen Schenau, Veldhoven, NL;
Gijsbert Rispens, Eersel, NL;
Brennan Peterson, Longmont, CO (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method including obtaining (i) measurements of a parameter of the feature, (ii) data related to a process variable of a patterning process, (iii) a functional behavior of the parameter defined as a function of the process variable based on the measurements of the parameter and the data related to the process variable, (iv) measurements of a failure rate of the feature, and (v) a probability density function of the process variable for a setting of the process variable, converting the probability density function of the process variable to a probability density function of the parameter based on a conversion function, where the conversion function is determined based on the function of the process variable, and determining a parameter limit of the parameter based on the probability density function of the parameter and the measurements of the failure rate.