The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2023

Filed:

Jun. 09, 2022
Applicant:

Yangtze Memory Technologies Co., Ltd., Wuhan, CN;

Inventors:

Kai Han, Wuhan, CN;

Yali Guo, Wuhan, CN;

Zhipeng Wu, Wuhan, CN;

Lu Zhang, Wuhan, CN;

Hang Yin, Wuhan, CN;

Simin Liu, Wuhan, CN;

Bo Xu, Wuhan, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H10B 43/27 (2023.01); H10B 41/10 (2023.01); H10B 41/27 (2023.01); H10B 41/35 (2023.01); H10B 43/10 (2023.01); H10B 43/35 (2023.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); H01L 29/0649 (2013.01); H10B 41/10 (2023.02); H10B 41/27 (2023.02); H10B 41/35 (2023.02); H10B 43/10 (2023.02); H10B 43/35 (2023.02);
Abstract

A memory device includes a staircase region and an array region, along a first lateral direction; a wall structure in the staircase region; and a first separation structure in the array region and arranged along the first lateral direction with the wall structure. The wall structure includes dielectric pairs of a first dielectric layer and a second dielectric layer stacked in the staircase region. The first separation structure is vertically through a stack structure in the array region. The stack structure includes pairs of the first dielectric layer and an electrode layer.


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