The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2023
Filed:
Oct. 18, 2021
Applicant:
Cmc Materials, Inc., Aurora, IL (US);
Inventors:
Chen-Chih Tsai, Naperville, IL (US);
Eric S. Moyer, Aurora, IL (US);
Ping Huang, Naperville, IL (US);
Assignee:
CMC Materials, Inc., Aurora, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 18/81 (2006.01); C08F 2/48 (2006.01); C08G 18/67 (2006.01); C08K 3/04 (2006.01); C08G 18/10 (2006.01); B24B 37/24 (2012.01);
U.S. Cl.
CPC ...
C08G 18/8116 (2013.01); B24B 37/24 (2013.01); C08F 2/48 (2013.01); C08G 18/10 (2013.01); C08G 18/6725 (2013.01); C08K 3/04 (2013.01);
Abstract
The invention provides a UV-curable resin for forming a chemical-mechanical polishing pad comprising: (a) one or more acrylate blocked isocyanates; (b) one or more acrylate monomers; and (c) a photoinitiator. The invention also provides a method of forming a chemical-mechanical polishing pad using the UV-curable resin.