The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2023

Filed:

Feb. 11, 2022
Applicant:

Globalwafers Co., Ltd., Hsinchu, TW;

Inventors:

Qingmin Liu, Glen Carbon, IL (US);

Haihe Liang, St. Peters, MO (US);

Junting Yang, Beijing, CN;

Assignee:

GlobalWafers Co., Ltd., Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 3/08 (2006.01); C11D 3/04 (2006.01); C11D 11/00 (2006.01); C11D 1/72 (2006.01); F26B 21/14 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02082 (2013.01); B08B 3/08 (2013.01); C11D 1/72 (2013.01); C11D 3/042 (2013.01); C11D 11/0047 (2013.01); F26B 21/14 (2013.01);
Abstract

Methods for removing an oxide film and for cleaning silicon-on-insulator structures are disclosed. The methods may involve immersing the silicon-on-insulator structure in a stripping bath to strip an oxide film from the surface of the silicon-on-insulator structure. The stripped silicon-on-insulator structure is immersed in an ozone bath comprising ozone. The ozone-treated silicon-on-insulator structure may be immersed in an SC-1 bath comprising ammonium hydroxide and hydrogen peroxide to clean the structure.


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