The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2023

Filed:

Jan. 23, 2019
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Koichi Hamada, Tokyo, JP;

Megumi Kimura, Tokyo, JP;

Momoyo Enyama, Tokyo, JP;

Ryou Yumiba, Tokyo, JP;

Makoto Sakakibara, Tokyo, JP;

Kei Sakai, Tokyo, JP;

Satoru Yamaguchi, Tokyo, JP;

Katsumi Setoguchi, Tokyo, JP;

Masumi Shirai, Tokyo, JP;

Yasunori Takasugi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/153 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/153 (2013.01); H01J 37/222 (2013.01); H01J 2237/2817 (2013.01);
Abstract

The objective of the present invention is to reduce differences between individual electron beam observation devices accurately by means of image correction. This method for calculating a correction factor for correcting images between a plurality of electron beam observation devices, in electron beam observation devices which generate images by scanning an electron beam across a specimen, is characterized by including: a step in which a first electron beam observation device generates a first image by scanning a first electron beam across first and second patterns, on either a specimen including the first pattern and the second pattern, having a different shape or size to the first pattern, or a first specimen including the first pattern and a second specimen including the second pattern; a step in which a second electron beam observation device generates a second image by scanning a second electron beam across the first and second patterns; and a step in which the first or second electron beam observation device calculates a correction factor at a peak frequency extracted selectively from first and second frequency characteristics calculated on the basis of the first and second images.


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