The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
Jun. 28, 2021
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Hendrik Steigerwald, Urmitz, DE;
Renzo Capelli, Heidenheim, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/72 (2012.01); G06F 30/39 (2020.01); G03F 1/24 (2012.01); G03F 1/52 (2012.01);
U.S. Cl.
CPC ...
G03F 1/72 (2013.01); G03F 1/24 (2013.01); G03F 1/52 (2013.01); G06F 30/39 (2020.01);
Abstract
The invention relates to a method and an apparatus for repairing at least one defect of a photolithographic mask for the extreme ultraviolet (EUV) wavelength range, wherein the method includes the steps of: (a) determining the at least one defect; and (b) ascertaining a repair shape for the at least one defect; (c) wherein the repair shape is diffraction-based in order to take account of a phase disturbance by the at least one defect.