The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2023
Filed:
Aug. 27, 2021
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Inventors:
Chih-Ping Yen, Hsinchu, TW;
Yen-Shuo Su, Hsinchu, TW;
Jui-Pin Wu, Hsinchu, TW;
Chun-Lin Chang, Zhubei, TW;
Han-Lung Chang, Kaohsiung, TW;
Heng-Hsin Liu, New Taipei, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70925 (2013.01); G03F 7/70025 (2013.01); G03F 7/70033 (2013.01); G03F 7/70916 (2013.01); G03F 7/70975 (2013.01);
Abstract
In order to prevent observed long-term energy decay of power amplifiers and correspondingly increase the lifespan of COlasers employing them, a hydrogen-doped mixing gas is supplied from an external pipeline during operation or periodic maintenance in order to effectively remove solid contaminants that build-up over time on a surface of a catalyst disposed within the power amplifier.