The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2023
Filed:
Mar. 03, 2021
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Ji Cui, Bolingbrook, IL (US);
William Weilun Hong, Hsinchu, TW;
Gin-Chen Huang, Hsinchu, TW;
Shich-Chang Suen, Hsinchu, TW;
Kei-Wei Chen, Hsinchu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/43 (2006.01); C11D 1/40 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 21/304 (2006.01); H01L 21/306 (2006.01); H01L 21/321 (2006.01); C11D 11/00 (2006.01); C11D 3/37 (2006.01); C11D 3/30 (2006.01); C11D 3/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C11D 1/40 (2013.01); C11D 3/0047 (2013.01); C11D 3/30 (2013.01); C11D 3/3723 (2013.01); C11D 3/3773 (2013.01); C11D 3/43 (2013.01); C11D 11/0047 (2013.01); H01L 21/02041 (2013.01); H01L 21/304 (2013.01); H01L 21/306 (2013.01); H01L 21/3212 (2013.01); H01L 29/66795 (2013.01); H01L 29/785 (2013.01);
Abstract
A cleaning composition for cleaning a surface of a substrate comprising silicon germanium after a chemical mechanical polishing process is provided. The cleaning composition includes an oligomeric or polymeric polyamine, at least one wetting agent, a pH adjusting agent, and a solvent.