The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2023

Filed:

Oct. 07, 2021
Applicant:

Globalfoundries U.s. Inc., Malta, NY (US);

Inventors:

Uzma B. Rana, Slingerlands, NY (US);

Steven M. Shank, Jericho, VT (US);

Anthony K. Stamper, Burlington, VT (US);

Assignee:

GlobalFoundries U.S. Inc., Malta, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 21/76 (2006.01); H01L 21/8234 (2006.01); H01L 27/088 (2006.01); H01L 29/10 (2006.01); H01Q 1/22 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0653 (2013.01); H01L 29/0847 (2013.01); H01L 29/1083 (2013.01); H01Q 1/2283 (2013.01);
Abstract

An integrated circuit (IC) structure includes an active device over a bulk semiconductor substrate, and an isolation structure around the active device in the bulk semiconductor substrate. The active device includes a semiconductor layer having a center region, a first end region laterally spaced from the center region by a first trench isolation, a second end region laterally spaced from the center region by a second trench isolation, a gate over the center region, and a source/drain region in each of the first and second end regions. The isolation structure includes: a polycrystalline isolation layer under the active device, a third trench isolation around the active device, and a porous semiconductor layer between the first trench isolation and the polycrystalline isolation layer and between the second trench isolation and the polycrystalline isolation layer.


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