The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2023

Filed:

Aug. 03, 2021
Applicant:

Powertech Technology Inc., Hukou Township, Hsinchu County, TW;

Inventors:

Shang-Yu Chang-Chien, Hukou Township, Hsinchu County, TW;

Hung-Hsin Hsu, Hukou Township, Hsinchu County, TW;

Nan-Chun Lin, Hukou Township, Hsinchu County, TW;

Assignee:

Powertech Technology Inc., Hukou Township, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 23/488 (2006.01); H01L 21/56 (2006.01); H01L 21/463 (2006.01); H01L 23/31 (2006.01);
U.S. Cl.
CPC ...
H01L 24/14 (2013.01); H01L 21/463 (2013.01); H01L 21/56 (2013.01); H01L 23/31 (2013.01); H01L 23/488 (2013.01); H01L 24/11 (2013.01);
Abstract

A semiconductor package comprising plurality of bumps and fabricating method thereof. The package has a chip, a plurality of first and second bumps, an encapsulation, a redistribution. The chip has a plurality of pads and an active area and the active surface has a first area and a second area surrounding the first, the pads formed on a first area of the active surface, each first bump formed on the corresponding pad. The second bumps are formed on the second area, each second bump has first and second different width layers. The encapsulation encapsulates the chip and bumps and is ground to expose the bumps therefrom. During grinding, all of the first bumps are completely exposed by determining a width of an exposed surface of the second bump to electrically connect to the redistribution is increased. Therefore, a shallow-grinding or over-grinding does not occur.


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