The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2023
Filed:
Dec. 11, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Toshiyuki Arakane, Miyagi, JP;
Tetsu Tsunamoto, Miyagi, JP;
Masanori Sato, Miyagi, JP;
Yoshinori Osaki, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); H01J 37/32082 (2013.01); H01J 37/32577 (2013.01); H01J 2237/24571 (2013.01); H01J 2237/334 (2013.01);
Abstract
A control method includes: (a) connecting a power supply to an electrode of an electrostatic chuck inside a chamber and applying a voltage from the power supply to the electrode; (b) after (a), switching a connection between the electrode and the power supply to a non-connection state; (c) after (b), supplying a gas into the chamber to generate plasma; and (d) measuring a potential of the electrode during (c).
Arakane, Toshiyuki. (2023). Control method and plasma processing apparatus (U.S. Patent No. 11658012). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11658012
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile