The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2023
Filed:
Oct. 11, 2021
Applicant:
Nova Ltd, Rehovot, IL;
Inventors:
Assignee:
NOVA LTD, Rehovot, IL;
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/956 (2006.01); H01L 21/66 (2006.01); G03F 7/20 (2006.01); G01N 21/88 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01N 21/95607 (2013.01); G01N 21/8806 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01); G03F 7/70616 (2013.01); H01L 22/30 (2013.01); G01B 2210/56 (2013.01); G01N 2021/8848 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01);
Abstract
A test structure for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis, the test structure having a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some of those features of the main pattern, parameters of which are to be controlled during metrology measurements.