The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2023
Filed:
Aug. 12, 2021
Shanghai Huali Integrated Circuit Corporation, Shanghai, CN;
Heng Liu, Shanghai, CN;
Zhigang Yang, Shanghai, CN;
Jianghua Leng, Shanghai, CN;
Tianpeng Guan, Shanghai, CN;
Shanghai Huali Integrated Circuit Corporation, Shanghai, CN;
Abstract
The present application provides a double control gate semi-floating gate transistor and a method for preparing the same. A lightly doped well region provided with a U-shaped groove is located on a substrate; one part of a floating gate oxide layer covers sidewalls and a bottom of the U-shaped groove, the other part covers the lightly doped well region on one side, and the floating gate oxide layer covering the lightly doped well region; a floating gate polysilicon layer is filled in the U-shaped groove and covers the floating gate oxide layer; a polysilicon control gate stack includes a polysilicon control gate oxide layer on the floating gate polysilicon layer and a polysilicon control gate polysilicon layer on the polysilicon control gate oxide layer; a metal control gate stack includes a high-K dielectric layer and a metal gate.