The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2023
Filed:
Sep. 29, 2020
Structure including polycrystalline resistor with dopant-including polycrystalline region thereunder
Applicant:
Globalfoundries U.s. Inc., Santa Clara, CA (US);
Inventors:
Yves T. Ngu, Essex Junction, VT (US);
Siva P. Adusumilli, South Burlington, VT (US);
Steven M. Shank, Jericho, VT (US);
Michael J. Zierak, Colchester, VT (US);
Mickey H. Yu, Essex Junction, VT (US);
Assignee:
GlobalFoundries U.S. Inc., Santa Clara, CA (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 49/02 (2006.01); H01L 27/12 (2006.01); H01L 21/3215 (2006.01); C30B 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 28/24 (2013.01); H01L 21/32155 (2013.01); H01L 27/1207 (2013.01); C30B 29/06 (2013.01);
Abstract
A structure includes a semiconductor substrate, and a polycrystalline resistor region over the semiconductor substrate. The polycrystalline resistor region includes a semiconductor material in a polycrystalline morphology. A dopant-including polycrystalline region is between the polycrystalline resistor region and the semiconductor substrate.