The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2023

Filed:

Oct. 21, 2020
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Kuo-Hsing Lee, Hsinchu County, TW;

Sheng-Yuan Hsueh, Tainan, TW;

Chien-Liang Wu, Tainan, TW;

Te-Wei Yeh, Taichung, TW;

Yi-Chun Chen, Kaohsiung, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/06 (2006.01); H01L 29/20 (2006.01); H01L 29/205 (2006.01); H01L 29/40 (2006.01); H01L 29/66 (2006.01); H01L 29/778 (2006.01); H01L 49/02 (2006.01); H01L 21/306 (2006.01); H01L 21/765 (2006.01); H01L 21/8252 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0605 (2013.01); H01L 21/30621 (2013.01); H01L 21/765 (2013.01); H01L 21/8252 (2013.01); H01L 27/0629 (2013.01); H01L 28/20 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 29/402 (2013.01); H01L 29/66462 (2013.01); H01L 29/7786 (2013.01);
Abstract

A resistor-transistor-logic (RTL) circuit with GaN structure, including a GaN layer, a AlGaN barrier layer on the GaN layer, multiple p-type doped GaN capping layers on the AlGaN barrier layer, wherein parts of the p-type doped GaN capping layers in a high-voltage region and in a low-voltage region convert the underlying GaN layer into gate depletion areas, the GaN layer not covered by the p-type doped GaN capping layers in a resistor region becomes a 2DEG resistor.


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