The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2023
Filed:
Aug. 27, 2021
Applicant:
Entegris, Inc., Billerica, MA (US);
Inventors:
Yan Liu, Lexington, MA (US);
Steven Donnell, Burlington, MA (US);
Jakub Rybczynski, Arlington, MA (US);
Chun Wang Chan, Somerville, MA (US);
Caleb Minsky, Medfield, MA (US);
Assignee:
ENTEGRIS, INC., Billerica, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01T 23/00 (2006.01); B23Q 3/15 (2006.01); H01L 21/683 (2006.01); B23K 1/19 (2006.01); H01L 21/687 (2006.01); B23K 1/00 (2006.01); B23K 103/00 (2006.01);
U.S. Cl.
CPC ...
B23Q 3/15 (2013.01); B23K 1/0016 (2013.01); B23K 1/19 (2013.01); H01L 21/6833 (2013.01); H01L 21/68757 (2013.01); B23K 2103/52 (2018.08);
Abstract
Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, the electrostatic chuck including embossments that are made of multiple deposited layers, the layers including diamond-like carbon layers and layers that contain silicon-based materials such as silicon carbide layers.