The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 2023

Filed:

Jan. 10, 2022
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Brennen K. Mueller, Hillsboro, OR (US);

Patrick Morrow, Portland, OR (US);

Kimin Jun, Hillsboro, OR (US);

Paul B. Fischer, Portland, OR (US);

Daniel Pantuso, Portland, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 25/065 (2006.01); H01L 23/00 (2006.01); H01L 21/768 (2006.01); H01L 21/762 (2006.01); H01L 21/84 (2006.01); H01L 23/485 (2006.01); H01L 21/48 (2006.01); H01L 23/48 (2006.01); H01L 23/498 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
H01L 25/0657 (2013.01); H01L 21/486 (2013.01); H01L 21/76251 (2013.01); H01L 21/76838 (2013.01); H01L 21/76898 (2013.01); H01L 21/845 (2013.01); H01L 23/481 (2013.01); H01L 23/485 (2013.01); H01L 23/49827 (2013.01); H01L 24/05 (2013.01); H01L 24/08 (2013.01); H01L 24/09 (2013.01); H01L 24/16 (2013.01); H01L 27/1211 (2013.01); H01L 24/06 (2013.01); H01L 24/13 (2013.01); H01L 24/48 (2013.01); H01L 27/1203 (2013.01); H01L 2224/02331 (2013.01); H01L 2224/02381 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/04042 (2013.01); H01L 2224/04105 (2013.01); H01L 2224/05569 (2013.01); H01L 2224/05571 (2013.01); H01L 2224/06181 (2013.01); H01L 2224/06182 (2013.01); H01L 2224/08146 (2013.01); H01L 2224/08235 (2013.01); H01L 2224/09181 (2013.01); H01L 2224/131 (2013.01); H01L 2224/13023 (2013.01); H01L 2224/16141 (2013.01); H01L 2224/16146 (2013.01); H01L 2224/16227 (2013.01); H01L 2224/16235 (2013.01); H01L 2224/17181 (2013.01); H01L 2224/48105 (2013.01); H01L 2224/48228 (2013.01); H01L 2224/48464 (2013.01); H01L 2224/73257 (2013.01); H01L 2225/06513 (2013.01); H01L 2225/06517 (2013.01); H01L 2225/06541 (2013.01); H01L 2225/06548 (2013.01); H01L 2225/06572 (2013.01); H01L 2924/13091 (2013.01);
Abstract

An apparatus including a circuit structure including a device stratum; one or more electrically conductive interconnect levels on a first side of the device stratum and coupled to ones of the transistor devices; and a substrate including an electrically conductive through silicon via coupled to the one or more electrically conductive interconnect levels so that the one or more interconnect levels are between the through silicon via and the device stratum. A method including forming a plurality of transistor devices on a substrate, the plurality of transistor devices defining a device stratum; forming one or more interconnect levels on a first side of the device stratum; removing a portion of the substrate; and coupling a through silicon via to the one or more interconnect levels such that the one or more interconnect levels is disposed between the device stratum and the through silicon via.


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