The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2023
Filed:
Oct. 30, 2020
Mitutoyo Corporation, Kanagawa-ken, JP;
Shannon Roy Campbell, Woodinville, WA (US);
Lukasz Redlarski, Eindhoven, NE;
Mitutoyo Corporation, Kanagawa-ken, JP;
Abstract
A metrology system is provided including a projected pattern for points-from-focus type processes. The metrology system includes an objective lens portion, a light source, a pattern projection portion and a camera. Different lenses (e.g., objective lenses) having different magnifications and cutoff frequencies may be utilized in the system. The pattern projection portion includes a pattern component with a pattern. At least a majority of the area of the pattern includes pattern portions that are not recurring at regular intervals across the pattern (e.g., as corresponding to a diverse spectrum of spatial frequencies that result in a relatively flat power spectrum over a desired range and with which different lenses with different cutoff frequencies may be utilized). The pattern is projected on a workpiece surface (e.g., for producing contrast) and an image stack is acquired, from which focus curve data is determined that indicates 3 dimensional positions of workpiece surface points.