The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2023

Filed:

Jul. 22, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chiao-Hua Cheng, Tainan, TW;

Shang-Chieh Chien, New Taipei, TW;

Heng-Hsin Liu, New Taipei, TW;

Li-Jui Chen, Hsinchu, TW;

Sheng-Kang Yu, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G06T 7/00 (2017.01); H04N 5/232 (2006.01); H04N 5/225 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70591 (2013.01); G03F 7/70033 (2013.01); G06T 7/001 (2013.01); H04N 5/23299 (2018.08); G06T 2207/20224 (2013.01); H04N 2005/2255 (2013.01);
Abstract

A method for inspecting an extreme ultraviolet (EUV) light source includes: removing a collector mirror of the EUV light source from a collector chamber; installing an inspection apparatus within the collector chamber, the apparatus including a selectively extendable and retractable member and a camera at one end of the member; operating a first actuator to extend the member along a path through the interior chamber of the EUV light source, thereby moving the camera to a given position within the interior chamber of the EUV light source; operating a second actuator to pan the camera about an axis of rotation, thereby establishing a given camera orientation within the interior of the EUV light source; and, capturing an image of the interior chamber of the EUV light source with the camera while the camera is at the given position and orientation established by the operation of the first and second actuators.


Find Patent Forward Citations

Cheng, Chiao-Hua. (2023). Inspection system for extreme ultraviolet (euv) light source (U.S. Patent No. 11567415). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11567415

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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