The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2022

Filed:

Aug. 22, 2019
Applicants:

Asml Holding N.v., Veldhoven, NL;

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Tamer Mohamed Tawfik Ahmed Mohamed Elazhary, New Canaan, CT (US);

Justin Lloyd Kreuzer, Trumbull, CT (US);

Franciscus Godefridus Casper Bijnen, Valkenswaard, NL;

Krishanu Shome, Cheshire, CT (US);

Assignees:

ASML HOLDING N.V., Veldhoven, NL;

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7088 (2013.01); G03F 7/70775 (2013.01); G03F 9/7049 (2013.01); G03F 9/7076 (2013.01);
Abstract

An apparatus and system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to a compact integrated optical device to create self images of the alignment mark which may be manipulated (e.g., mirrored, polarized) and combined to obtain information on the position of the mark and distortions within the mark. Also disclosed is a system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to an optical fiber arrangement to obtain information such as the position of the mark and distortions within the mark.


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