The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2022

Filed:

Aug. 17, 2021
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Anton J. Devilliers, Clifton Park, NY (US);

Anthony R. Schepis, Averill Park, NY (US);

David Conklin, Saratoga Springs, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 23/544 (2006.01); G06T 7/33 (2017.01); G06V 10/24 (2022.01); G06T 7/00 (2017.01); H01L 21/66 (2006.01); G06T 7/73 (2017.01); H04N 5/225 (2006.01); G03F 9/00 (2006.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G03F 7/7065 (2013.01); G03F 7/7085 (2013.01); G03F 7/70466 (2013.01); G03F 7/70683 (2013.01); G03F 9/7046 (2013.01); G03F 9/7073 (2013.01); G03F 9/7084 (2013.01); G03F 9/7088 (2013.01); G06T 7/001 (2013.01); G06T 7/337 (2017.01); G06T 7/74 (2017.01); G06V 10/245 (2022.01); H01L 22/20 (2013.01); H01L 23/544 (2013.01); H04N 5/2256 (2013.01); G01N 21/95607 (2013.01); G06T 2207/10048 (2013.01); G06T 2207/10152 (2013.01); G06T 2207/30148 (2013.01); G06V 2201/06 (2022.01); H01L 2223/54426 (2013.01);
Abstract

Aspects of the present disclosure provide an imaging system. For example, in the imaging system a first light source can generate a first light beam of a first wavelength, a second light source can generate a second light beam of a second wavelength, the second light beam having power sufficient to pass through at least a portion of a thickness of a wafer, an alignment module can coaxially align the second light beam with the first light beam, a coaxial module can focus the coaxially aligned first and second light beams onto a first pattern located on a front side of the wafer and a second pattern located below the first pattern, respectively, and an image capturing module can capture a first image of the first pattern and a second image of the second pattern. The second image can be captured via quantum tunneling imaging or infrared (IR) transmission imaging.


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