The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 13, 2022

Filed:

Aug. 10, 2020
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Hendrik Jan Hidde Smilde, Veldhoven, NL;

Bastiaan Onne Fagginger Auer, Utrecht, NL;

Davit Harutyunyan, Eindhoven, NL;

Patrick Warnaar, Tilburg, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01); G01B 9/04 (2006.01); G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70625 (2013.01); G01B 9/04 (2013.01); G03F 7/70633 (2013.01); G03F 7/70641 (2013.01); G03F 7/70683 (2013.01); G03F 9/7092 (2013.01); G01B 2210/56 (2013.01); G01N 2021/8822 (2013.01);
Abstract

In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.


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