The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2022
Filed:
May. 09, 2019
Samsung Electronics Co., Ltd., Suwon-si, KR;
Eun-Woo Lee, Seongnam-si, KR;
Kyo-Hyeok Kim, Seoul, KR;
Hyo-Sung Kim, Suwon-si, KR;
Jong-Woo Sun, Hwaseong-si, KR;
Seung-Bo Shim, Seoul, KR;
Kyung-Hoon Lee, Seoul, KR;
Jae-Hyun Lee, Yongin-si, KR;
Ji-Soo Im, Seongnam-si, KR;
Min-Young Hur, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A plasma processing apparatus includes a substrate chuck having a first surface for supporting a substrate, a second surface opposite to the first surface, and a sidewall, a focus ring for surrounding a perimeter of the substrate, and an edge block for supporting the focus ring. The edge block includes a side electrode on the sidewall of the substrate chuck and a bottom electrode on the second surface of the substrate chuck.