Eun-Woo Lee

Title: Innovator Spotlight: Eun-Woo Lee and His Contribution to Plasma Processing Technology

Introduction: Eun-Woo Lee, based in Seongnam-si, South Korea, is recognized for his innovative efforts in the field of plasma processing technology. With one patent to his name, Lee plays an important role at Samsung Electronics Co., Ltd. His groundbreaking work continues to influence advancements in the semiconductor industry.

Latest Patents: Eun-Woo Lee holds a patent for a Plasma Processing Apparatus. This invention includes a substrate chuck that features a first surface for substrate support, an opposite second surface, a sidewall, and a focus ring designed to encircle the substrate's perimeter. Additionally, the apparatus integrates an edge block that enhances support for the focus ring, incorporating a side electrode on the chuck's sidewall and a bottom electrode on its second surface. This innovation aims to optimize plasma processing efficiency and precision within semiconductor manufacturing.

Career Highlights: As a dedicated member of Samsung Electronics Co., Ltd., Eun-Woo Lee has contributed to numerous projects that elevate the standards of technology in the field. His expertise in plasma processing is pivotal for the innovative advancement of semiconductor fabrication methods.

Collaborations: Throughout his career, Eun-Woo Lee has collaborated with talented coworkers such as Kyo-Hyeok Kim and Hyo-Sung Kim. Their combined efforts demonstrate the effectiveness of teamwork in achieving significant innovations and enhancing technological development.

Conclusion: Eun-Woo Lee's contributions to plasma processing technology exemplify the innovative spirit of modern inventors. With a focus on advancing semiconductor technologies, his work not only supports Samsung Electronics Co., Ltd. but also serves as an inspiration for future innovations in the industry.