The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2022
Filed:
Oct. 22, 2019
Hitachi High-technologies Corporation, Tokyo, JP;
Tomohiko Ogata, Tokyo, JP;
Hisaya Murakoshi, Tokyo, JP;
Masaki Hasegawa, Tokyo, JP;
Noriyuki Kaneoka, Tokyo, JP;
Katsunori Onuki, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
In an electron beam device provided with two columns including an irradiation optical system and an imaging optical system, a photoelectron image for use in adjusting the irradiation optical system is made sharper. The electron beam device includes: an irradiation optical system which irradiates a sample placed on a stage with an electron beam; a light irradiation unitwhich irradiates the sample with light containing ultraviolet rays; a sample voltage control unitwhich applies a negative voltage to the sample so that, before the electron beam reaches the sample, the electron orbit inverts; and an imaging optical system which acquires a mirror electron image by forming an image of mirror electrons reflected by application of the negative voltage. In the electron beam device, the imaging optical system includes a sensorwhich obtains a mirror electron image and a stray light suppression partwhich is provided between the sensor and the stageand which suppresses reaching the sensor of the light emitted from the light irradiation unit.