The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2022

Filed:

May. 13, 2016
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Duan-Fu Stephen Hsu, Fremont, CA (US);

Rafael C. Howell, Santa Clara, CA (US);

Jianjun Jia, San Jose, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G06F 30/367 (2020.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01); G03F 7/70125 (2013.01); G06F 30/367 (2020.01); G06F 2119/18 (2020.01);
Abstract

A method including: determining a first simulated partial image formed, by a lithographic projection apparatus, from a first radiation portion propagating along a first group of one or more directions; determining a second simulated partial image formed, by the lithographic projection apparatus, from a second radiation portion propagating along a second group of one or more directions; and determining an image by incoherently adding the first partial image and the second partial image, wherein the first group of one or more directions and the second group of one or more directions are different.


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