The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2022
Filed:
May. 26, 2021
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Maarit Mäkelä, Helsinki, FI;
Timo Hatanpää, Espoo, FI;
Mikko Ritala, Espoo, FI;
Markku Leskelä, Espoo, FI;
Assignee:
ASM IP HOLDING B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/06 (2006.01); C23C 16/455 (2006.01); C23C 16/18 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45553 (2013.01); C23C 16/06 (2013.01); C23C 16/18 (2013.01); C23C 16/45527 (2013.01);
Abstract
Vapor deposition processes for forming thin films comprising gold on a substrate in a reaction space are provided. The processes can be cyclical vapor deposition processes, such as atomic layer deposition (ALD) processes. The processes can include contacting the substrate with a gold precursor comprising at least one sulfur donor ligand and at least one alkyl ligand, and contacting the substrate with a second reactant comprising ozone. The deposited thin films comprising gold can be uniform, continuous, and conductive at very low thicknesses.