The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2022
Filed:
Apr. 15, 2021
Ict Integrated Circuit Testing Gesellschaft Für Halbleiterprüftechnik Mbh, Heimstetten, DE;
Benjamin John Cook, Munich, DE;
Dieter Winkler, Munich, DE;
Markus Thomann, Poing, DE;
Thomas Kemen, Meppen, DE;
Roman Barday, Poing, DE;
Abstract
A charged particle beam apparatus for inspecting a specimen with a plurality of beamlets is described. The charged particle beam apparatus includes a charged particle beam emitter () for generating a charged particle beam () propagating along an optical axis (A) and a multi-beamlet generation- and correction-assembly (), including a first multi-aperture electrode () with a first plurality of apertures for creating the plurality of beamlets from the charged particle beam, at least one second multi-aperture electrode () with a second plurality of apertures of varying diameters for the plurality of beamlets for providing a field curvature correction, and a plurality of multipoles () for individually influencing each of the plurality of beamlets, wherein the multi-beamlet generation- and correction-assembly () is configured to focus the plurality of beamlets to provide a plurality of intermediate beamlet crossovers. The charged particle beam apparatus further includes an objective lens () for focusing each of the plurality of beamlets to a separate location on the specimen, and a single transfer lens () for beamlet collimation arranged between the multi-beamlet generation- and correction-assembly and the objective lens. Further, a method of inspecting a specimen with a charged particle beam apparatus is described.