The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2022

Filed:

Jan. 21, 2021
Applicant:

Yangtze Memory Technologies Co., Ltd., Hubei, CN;

Inventors:

Yali Song, Hubei, CN;

Li Hong Xiao, Hubei, CN;

Ming Wang, Hubei, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 16/04 (2006.01); H01L 27/11582 (2017.01); G11C 16/14 (2006.01); H01L 21/311 (2006.01); H01L 23/528 (2006.01); H01L 27/11565 (2017.01); H01L 27/1157 (2017.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11582 (2013.01); G11C 16/0483 (2013.01); G11C 16/14 (2013.01); H01L 21/31116 (2013.01); H01L 23/528 (2013.01); H01L 27/1157 (2013.01); H01L 27/11565 (2013.01); H01L 29/0847 (2013.01); H01L 29/1037 (2013.01); H01L 21/0276 (2013.01); H01L 21/31144 (2013.01);
Abstract

A memory device includes a stack of alternating word line layers and insulating layers over a substrate. The word line layers includes a bottom select gate (BSG) positioned over the substrate. The memory device includes first dielectric trenches that are formed in the BSG of the word line layers and extend in the length direction of the substrate to separate the BSG into a plurality of sub-BSGs. The memory device also includes a first common source region (CSR) that is formed over the substrate and extends in the length direction of the substrate. The first CRS further extends through the word line layers and the insulating layers in a height direction of the substrate, where the first CSR is arranged between two adjacent first dielectric trenches of the first dielectric trenches.


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