The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2022

Filed:

Feb. 13, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Joseph C. Olson, Beverly, MA (US);

Morgan Evans, Manchester, MA (US);

Thomas Soldi, West Simsbury, CT (US);

Rutger Meyer Timmerman Thijssen, Sunnyvale, CA (US);

Maurice Emerson Peploski, Potsdam, NY (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); H01J 29/07 (2006.01); H01J 37/20 (2006.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
H01J 37/08 (2013.01); H01J 29/07 (2013.01); H01J 37/20 (2013.01); H01J 37/3056 (2013.01);
Abstract

Methods of producing grating materials with variable height are provided. In one example, a method may include providing a grating material atop a substrate, and positioning a shadow mask between the grating material and an ion source, wherein the shadow mask is separated from the grating material by a distance. The method may further include etching the grating material using an ion beam passing through a set of openings of the shadow mask, wherein a first depth of a first portion of the grating material is different than a second depth of a second portion of the grating material.


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