Potsdam, NY, United States of America

Maurice Emerson Peploski


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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3 patents (USPTO):Explore Patents

Title: Maurice Emerson Peploski: Innovator in Grating Materials and Etching Techniques

Introduction

Maurice Emerson Peploski is a notable inventor based in Potsdam, NY (US). He has made significant contributions to the field of materials science, particularly in the development of methods for producing grating materials and improving etching techniques. With a total of three patents to his name, Peploski's work has implications for various applications in technology and manufacturing.

Latest Patents

Peploski's latest patents include innovative methods that enhance the production of grating materials with variable heights. One of his patents, titled "Shadow mask apparatus and methods for variable etch depths," describes a method that involves positioning a shadow mask between a grating material and an ion source. This method allows for etching the grating material using an ion beam, resulting in different depths for various portions of the material. Another patent, "Etch improvement," outlines a technique for exposing a first material on a substrate to an ion beam at a specific angle. This method generates depth variations in the structures formed, showcasing Peploski's expertise in manipulating materials at a microscopic level.

Career Highlights

Peploski is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering and technology. His work at Applied Materials has allowed him to collaborate with other talented professionals in the industry, further advancing his research and innovations.

Collaborations

Some of Peploski's coworkers include Joseph C. Olson and Morgan Evans, who contribute to the collaborative environment that fosters innovation and creativity in their projects.

Conclusion

Maurice Emerson Peploski's contributions to the field of materials science through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor. His innovative methods for producing grating materials and improving etching techniques continue to impact the industry positively.

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