The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2022
Filed:
Sep. 04, 2020
Asml Netherlands B.v., Veldhoven, NL;
Maurits Van Der Schaar, Veldhoven, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Omer Abubaker Omer Adam, Veldhoven, NL;
Te-Chih Huang, Veldhoven, NL;
Youping Zhang, Santa Clara, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
There is disclosed a method of measuring a process parameter for a manufacturing process involving lithography. In a disclosed arrangement the method comprises performing first and second measurements of overlay error in a region on a substrate, and obtaining a measure of the process parameter based on the first and second measurements of overlay error. The first measurement of overlay error is designed to be more sensitive to a perturbation in the process parameter than the second measurement of overlay error by a known amount.