The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 12, 2022

Filed:

May. 06, 2019
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Roie Volkovich, Migdal Ha'emek, IL;

Renan Milo, Rishon Lezion, IL;

Liran Yerushalmi, Zicron Yaacob, IL;

Moran Zaberchik, Ahuzat Barak, IL;

Yoel Feler, Haifa, IL;

David Izraeli, Haifa, IL;

Assignee:

KLA-TENCOR CORPORATION, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67276 (2013.01); G05B 19/41875 (2013.01); G05B 2219/32368 (2013.01);
Abstract

A method for measurement of misregistration in the manufacture of semiconductor device wafers, the method including measuring misregistration between layers of a semiconductor device wafer at a first instance and providing a first misregistration indication, measuring misregistration between layers of a semiconductor device wafer at a second instance and providing a second misregistration indication, providing a misregistration measurement difference output in response to a difference between the first misregistration indication and the second misregistration indication, providing a baseline difference output and ameliorating the difference between the misregistration measurement difference output and the baseline difference output.


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