The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2022
Filed:
Jan. 06, 2021
Kla Corporation, Milpitas, CA (US);
Andrew V. Hill, Berkeley, CA (US);
Amnon Manassen, Haifa, IL;
Avi Abramov, Haifa, IL;
Asaf Granot, Lotem, IL;
Andrei V. Shchegrov, Campbell, CA (US);
KLA Corporation, Milpitas, CA (US);
Abstract
A metrology measurement apparatus may include one or more illumination sources, a beamsplitter configured to receive illumination from the one or more illumination sources from an illumination pathway and direct the illumination along a measurement pathway, and an objective lens. The objective lens may direct the illumination from the measurement pathway to a sample, collect light from the sample, and direct the collected light along the measurement pathway to the beamsplitter such that the beamsplitter may direct the collected light along a collection pathway to a detector. The apparatus may further include a pupil-plane scanner along the measurement pathway with a pupil relay and a deflector in a relayed pupil plane such that adjusting the deflector adjusts a position of the illumination spot on the sample without modifying a position of the illumination pupil distribution or a position of a distribution of the collected light along the collection pathway.