The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2022

Filed:

Aug. 14, 2018
Applicant:

Korea Research Institute of Standards and Science, Daejeon, KR;

Inventors:

Young-sik Ghim, Sejong, KR;

The-mahn Nguyen, Daejeon, KR;

Hyug-gyo Rhee, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G01B 11/25 (2006.01); H04N 5/235 (2006.01);
U.S. Cl.
CPC ...
G01B 11/2441 (2013.01); G01B 11/2527 (2013.01); H04N 5/2351 (2013.01);
Abstract

The present disclosure is directed to a system and a method for compensating non-linear response characteristics in measuring the shape of an object using phase-shifting deflectomerty. More particularly, the present disclosure is directed to a method for compensating non-linear response characteristics in phase-shifting deflectometry including steps of: generating a pattern by a pattern generating portion and projecting the same to a measurement object; obtaining an image of a deformed pattern reflected from the measurement object by a detector; linearizing non-linear responses on the basis of a look up table considering non-linear response characteristics of the pattern generating portion and the detector by a compensation means; and compensating phase-shifting amounts generated due to non-linear response characteristics by the compensation means.


Find Patent Forward Citations

Loading…