The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2022
Filed:
Feb. 21, 2019
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Hiroyuki Hayashi, Yamanashi, JP;
Rui Kanemura, Yamanashi, JP;
Satoshi Takagi, Yamanashi, JP;
Mitsuhiro Okada, Yamanashi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/311 (2006.01); H01L 21/3205 (2006.01); C23C 16/02 (2006.01); C23C 16/24 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02046 (2013.01); C23C 16/02 (2013.01); C23C 16/24 (2013.01); H01L 21/0223 (2013.01); H01L 21/02057 (2013.01); H01L 21/02255 (2013.01); H01L 21/02365 (2013.01); H01L 21/31116 (2013.01); H01L 21/3205 (2013.01); H01L 21/67028 (2013.01);
Abstract
There is provided a film forming method comprising an organic substance removal step of removing an organic substance adhering to an oxide film generated on a surface of a base by supplying a hydrogen-containing gas and an oxygen-containing gas to the base; an oxide film removal step of removing the oxide film formed on the surface of the base after the organic substance removal step; and a film forming step of forming a predetermined film on the surface of the base after the oxide film removal step.