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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11251034 B1

PDFFull Text
Date of Patent:
Feb. 15, 2022

Filed:

Feb. 21, 2019

Film forming method and substrate processing apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Hiroyuki Hayashi, Yamanashi, JP;

Rui Kanemura, Yamanashi, JP;

Satoshi Takagi, Yamanashi, JP;

Mitsuhiro Okada, Yamanashi, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorneys:

Nath, Goldberg & Meyer

Jerald L. Meyer

Tanya E. Harkins

Primary Examiner:

John A Bodnar

Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/311 (2006.01); H01L 21/3205 (2006.01); C23C 16/02 (2006.01); C23C 16/24 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02046 (2013.01); C23C 16/02 (2013.01); C23C 16/24 (2013.01); H01L 21/0223 (2013.01); H01L 21/02057 (2013.01); H01L 21/02255 (2013.01); H01L 21/02365 (2013.01); H01L 21/31116 (2013.01); H01L 21/3205 (2013.01); H01L 21/67028 (2013.01);
Abstract

There is provided a film forming method comprising an organic substance removal step of removing an organic substance adhering to an oxide film generated on a surface of a base by supplying a hydrogen-containing gas and an oxygen-containing gas to the base; an oxide film removal step of removing the oxide film formed on the surface of the base after the organic substance removal step; and a film forming step of forming a predetermined film on the surface of the base after the oxide film removal step.

Find Patent Forward Citations

Hayashi, Hiroyuki. (2022). Film forming method and substrate processing apparatus (U.S. Patent No. 11251034). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11251034

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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